Patent quality indicator system: Measurement based on China invention patent data

Abstract

Abstract: The paper studies the connotation of patent quality and its composition, and builds up a system to measure the patent quality from four dimensions: invention quality, document quality, quality under examination, and commercial quality. From 2011 to 2012, the patent quality of China has slightly improved. Both document quality and commercial quality has improved, while invention quality witnesses a decline. The patent quality in Eastern region of China is the best, while the patent quality in mid-western regions is relatively lower. Among the 7 selected countries, the patent quality of China shows the worst performance, especially the document quality and the commercial quality. In the end, the paper puts forward some policy recommendations to improve the patent quality of China.

Key words: inventive patent, patent quality, indicator system, comparative study

CLC Number:

D923.41

Song Hefa, Mu Rongping, Chen Fang, Zhang Sizhong, Li Zhenxing. Patent quality indicator system: Measurement based on China invention patent data[J]. Science Research Management, 2014, 35(11): 68-76.

References

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