科研管理

科研管理 ›› 2024, Vol. 45 ›› Issue (8): 83-94.DOI: 10.19571/j.cnki.1000-2995.2024.08.009

• 论文 • 上一篇    下一篇

后发企业与创新联合体共演驱动产业关键核心技术持续突破的机制研究

张贝贝1，尹西明2，陈泰伦3，余江1,4，陈劲5   

  1. 1.中国科学院科技战略咨询研究院，北京100190；
    2.北京理工大学管理学院，北京100081；
    3.浙江大学管理学院，浙江 杭州310058；
    4.中国科学院大学公共政策与管理学院，北京100049；
    5.清华大学 经济管理学院，北京100084

  • 收稿日期:2023-10-07 修回日期:2024-04-10 出版日期:2024-08-20 发布日期:2024-08-08
  • 通讯作者: 尹西明
  • 基金资助:
    国家自然科学基金青年项目：“多层次系统视角下中国高校学术创业与成果转化促进机制研究”（72104027，2022—2024）；国家自然科学基金重点项目：“数字技术创新机制、突破路径与政策体系研究”（72334007，2024—2028）；中国工程院前瞻性储备性战略咨询研究项目：“‘创新链、产业链、供应链’三链一体化协同创新发展战略研究”（2023-JB-10，2022—2025）；中国科学院战略性先导科技专项（专项编号XDA0380000，2023—2027）。

Mechanism study on the co-evolution of latecomer-led innovation consortia driving continuous breakthrough of key core technology

Zhang Beibei1, Yin Ximing2, Chen Tailun3, Yu Jiang1,4, Chen Jin5   

  1. 1. Institutes of Science and Development, Chinese Academy of Sciences, Beijing 100190, China;
    2. School of Management, Beijing Institute of Technology, Beijing 100081, China;
    3. School of Management, Zhejiang University, Hangzhou 310058, Zhejiang, China;
     4. School of Public Policy and Management, University of Chinese Academy of Sciences, Beijing 100049, China;
    5. School of Economics and Management, Tsinghua University, Beijing 100084, China
  • Received:2023-10-07 Revised:2024-04-10 Online:2024-08-20 Published:2024-08-08

摘要：   如何持续突破产业关键核心技术，是以科技创新引领现代化产业体系构建、加快发展新质生产力的核心抓手与重点议题。然而现有研究鲜有关注中观层面如何桥接宏观产业生态和微观主体，进而实现产业关键核心技术持续突破的过程机制这一重要的理论与实践议题。本研究聚焦光刻机这一集成电路产业代表性关键核心技术，以光刻系统集成商ASML为案例，运用纵向单案例方法系统探究：后发企业如何通过与创新联合体共演，持续突破产业关键核心技术并实现超越追赶？研究发现：面向光刻技术的阶跃性目标，基于“动机（M）-战略（S）-创新联合体（C）”的过程逻辑，ASML与其创新联合体持续共演，通过“权力分配”主体协同、“产业牵引”知识整合和“核心-外围”利益共生三种价值共创机制，驱动光刻机技术持续突破。随着创新联合体从萌芽、升级、强化到共生，ASML逐步完成其在光刻市场的后发追赶到引领超越。研究结论拓展并深化了产业创新生态系统视角下产业关键核心技术突破与后发追赶的理论研究，为培育壮大科技领军企业，提升产业技术创新能力，加快现代化产业体系建设和发展新质生产力提供重要启示。

关键词: 产业创新生态, 创新联合体, 产业关键核心技术, ASML, 后发追赶, 新质生产力

Abstract:     Continuous breakthroughs of industrial key core technologies are the key for promoting innovation to lead the construction of modernized industrial system, promoting new-quality productivity. However, few studies have paid attention to the important theoretical and practical issue of how meso-organizations bridge the macro-ecology and micro-agent to promote the process mechanism of continuous breakthroughs in industrial key core technologies. This study focused on photolithography, a representative key core technology of the IC industry, and took ASML as the research object, by using the case study method to systematically explore: how latecomers can continuously make breakthroughs in industrial key core technologies and go beyond catch-up through co-evolution with innovation consortium. We found that: facing the stepwise goal of lithography technology, based on the process logic of "Motivation (M)-Strategy (S)-Innovation Consortium (C)", ASML and its innovation consortium continue to co-evolve, which drives the continuous breakthrough of lithography technology through the three value co-creative mechanisms. This process consists of the synergy of the main body of "distribution of power", integration of knowledge in "industrial traction", and "core periphery" interest co-generation. During this process, the innovation consortium evolves from the embryonic, upgrading, consolidation stages to the symbiosis stage, while ASML has gradually accomplished the catching-up to the leading position in the lithography market. This research will deepen the theoretical research on the breakthroughs and catch-up in industrial key core technologies from the perspective of industrial innovation ecology, and provide important inspirations for promoting industrial technological innovation system and capability, and accelerating the development of new-quality productivity.

Key words: industrial innovation ecology, innovation consortium, industrial key core technology, ASML, catch-up, new-quality productivity